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Proceedings Paper

A proposal for an MCC (multi-column cell with lotus root lens) system to be used as a mask-making e-beam tool
Author(s): Hiroshi Yasuda; Takeshi Haraguchi; Akio Yamada
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Paper Abstract

As the technology roadmap continuously goes along, pattern density increases beyond more than 250 G shots per a mask until 2010. However the total usable beam current is limited by Coulomb interaction to maximum several hundred nanoampere and by the settling time of positioning amplifier the shot rate is restricted to around 10 MHz. To overcome those restrictions we propose MCC (Multi-Column cell with Lotus Root lens) system to use for mask making. In this system plural numbers (4 or 16) of square variable shaped beams and some kinds of Cell Projection beams including triangles and fundamental DRAM or SRAM patterns are independently controlled to expose simultaneously different parts of a glass substrate. Coulomb interaction between beams of different CCs no more exists and parallel writing is carried out. With this system a mask can be exposed from four to sixteen times faster than present single column system. We evaluated the beam performance of the electron optics Proof of Concept (PoC) system of Multi-Column Cell (MCC) method. As for the two beams at the near center of 4 x 4 layout with 25 mm pitch they show the good uniformity and low interference.

Paper Details

Date Published: 6 December 2004
PDF: 11 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.568255
Show Author Affiliations
Hiroshi Yasuda, Advantest Corp. (Japan)
Takeshi Haraguchi, Advantest Corp. (Japan)
Akio Yamada, Advantest Corp. (Japan)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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