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Proceedings Paper

New fabrication technology for photonic crystal waveguides
Author(s): Sohan Singh Mehta; B. Ramana Murthy; Zhao Hui; * Suryani; Wei Ji; Mahadevan K. Iyer; My T. Doan
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Paper Abstract

We have developed a deep ultraviolet (DUV) lithography technique for fabricating super dense silicon based photonic crystals. Binary mask is used to create nano scale patterns of very high density. Based on the simulation, photonic crystals with both square and triangular lattice of air cylinders are designed and fabricated to work in communication frequency range (λ within 1.3 to 1.55μm) on amorphous silicon. In order to pattern circular hole we designed different kind of polygons on the mask and layout pattern was under sized at constant pitch. Bottom anti reflection coating (BARC) recipe was developed to improve circularity of the pattern and reduce interhole spacing.

Paper Details

Date Published: 20 December 2004
PDF: 11 pages
Proc. SPIE 5577, Photonics North 2004: Optical Components and Devices, (20 December 2004); doi: 10.1117/12.567602
Show Author Affiliations
Sohan Singh Mehta, Institute of Microelectronics (Singapore)
B. Ramana Murthy, Institute of Microelectronics (Singapore)
Zhao Hui, National Univ. of Singapore (Singapore)
* Suryani, National Univ. of Singapore (Singapore)
Wei Ji, National Univ. of Singapore (Singapore)
Mahadevan K. Iyer, Institute of Microelectronics (Singapore)
My T. Doan, Institute of Microelectronics (Singapore)

Published in SPIE Proceedings Vol. 5577:
Photonics North 2004: Optical Components and Devices
John C. Armitage; Simon Fafard; Roger A. Lessard; George A. Lampropoulos, Editor(s)

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