Optical reducing systems for the extreme ultraviolet projection lithography are actively developed in the last few years. Optical elements of these systems are required to be of super-high optical quality. For the systems operatingin the 13-nm wavelength range, their optical distortions should not exceed 1 nm in magnitude. Manufacturing of such elements requires large financial injections. In this report, we consider how to use thermal deformation of an optical element exposed to light for improvement of optical quality of the element. It is shown, in particular, that residual quasi-static large-scale (20% of diameter of the element) optical distortions, about 15nm in magnitude, can be compensated with the proposed technique down to 0.5 nm (i.e.≈λ₀/20 - λ₀/30 in the EUV).

Date Published: 12 October 2004
PDF: 9 pages
Proc. SPIE 5553, Advanced Wavefront Control: Methods, Devices, and Applications II, (12 October 2004); doi: 10.1117/12.567532

Published in SPIE Proceedings Vol. 5553:
Advanced Wavefront Control: Methods, Devices, and Applications II
John D. Gonglewski; Mark T. Gruneisen; Michael K. Giles, Editor(s)