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Proceedings Paper

Thermo-correction of quasi-static optical distortions in optical reducing systems for EUV projection lithography
Author(s): Sergei Alexandrovich Dimakov; Boris Vladimirovich Kislitsyn
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Paper Abstract

Optical reducing systems for the extreme ultraviolet projection lithography are actively developed in the last few years. Optical elements of these systems are required to be of super-high optical quality. For the systems operatingin the 13-nm wavelength range, their optical distortions should not exceed 1 nm in magnitude. Manufacturing of such elements requires large financial injections. In this report, we consider how to use thermal deformation of an optical element exposed to light for improvement of optical quality of the element. It is shown, in particular, that residual quasi-static large-scale (20% of diameter of the element) optical distortions, about 15nm in magnitude, can be compensated with the proposed technique down to 0.5 nm (i.e.≈λ0/20 - λ0/30 in the EUV).

Paper Details

Date Published: 12 October 2004
PDF: 9 pages
Proc. SPIE 5553, Advanced Wavefront Control: Methods, Devices, and Applications II, (12 October 2004); doi: 10.1117/12.567532
Show Author Affiliations
Sergei Alexandrovich Dimakov, Research Institute for Laser Physics (Russia)
Boris Vladimirovich Kislitsyn, Research Institute for Laser Physics (Russia)

Published in SPIE Proceedings Vol. 5553:
Advanced Wavefront Control: Methods, Devices, and Applications II
John D. Gonglewski; Mark T. Gruneisen; Michael K. Giles, Editor(s)

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