Share Email Print
cover

Proceedings Paper

Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement
Author(s): Satoshi Matsuyama; Hidekazu Mimura; Kazuya Yamamura; Hirokatsu Yumoto; Yasuhisa Sano; Katsuyoshi Endo; Yuzo Mori; Makina Yabashi; Kenji Tamasaku; Yoshinori Nishino; Tetsuya Ishikawa; Kazuto Yamauchi
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The spatial resolution of the scanning X-ray microscopy apparently depends on the beam size of the focused X-ray. Recently, highly accurate elliptical mirrors were reported to be fabricated, and nearly diffraction-limited line focusing was achieved. In this study, to realize diffraction-limited and 2-dimentional focusing with such highly accurate mirrors, accuracies to be realized in mirror alignings, for example, adjusting the glancing angle and the in-plane rotation, were estimated by employing two types of simulators. They are appropriately based on geometrical or wave-optical theories. They are alternatively employed according to the degree of accuracy required in the mirror alignment. A focusing unit with the adjusting mechanism fulfilling the required alignment accuracies was constructed, and the relationships between the alignment errors and focused beam profiles were quantitatively examined at the 1km-long beamline (BL29XUL) of SPring-8. Obtained results were in good agreement with the calculated results. Additionally, the alignment accuracy to be realized in the K-B unit equipping mirrors of larger NA (numerical aperture) was calculated to realize sufficient performances in focusing.

Paper Details

Date Published: 18 October 2004
PDF: 11 pages
Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); doi: 10.1117/12.567515
Show Author Affiliations
Satoshi Matsuyama, Osaka Univ. (Japan)
Hidekazu Mimura, Osaka Univ. (Japan)
Kazuya Yamamura, Osaka Univ. (Japan)
Hirokatsu Yumoto, Osaka Univ. (Japan)
Yasuhisa Sano, Osaka Univ. (Japan)
Katsuyoshi Endo, Osaka Univ. (Japan)
Yuzo Mori, Osaka Univ. (Japan)
Makina Yabashi, Japan Synchorotron Radiation Research Institute (Japan)
Kenji Tamasaku, RIKEN-The Institute of Physical and Chemical Research (Japan)
Yoshinori Nishino, RIKEN-The Institute of Physical and Chemical Research (Japan)
Tetsuya Ishikawa, Japan Synchorotron Radiation Research Institute (Japan)
RIKEN-The Institute of Physical and Chemical Research (Japan)
Kazuto Yamauchi, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 5533:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)

© SPIE. Terms of Use
Back to Top