Proceedings Paper
Fabrication technology of ultraprecise mirror optics to realize hard x-ray nanobeam| Format | Member Price | Non-Member Price |
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Paper Abstract
In our previous study, we realized a hard X-ray focused beam having a 180nm×90nm focal size using fabricated ellip-tical mirrors. In this study, to realize a smaller focal size, more steeply curved elliptical mirrors with platinum-coated surfaces were fabricated. We showed that aspheric quality mirrors can be manufactured with recently developed ma-chining methods. We carried out line focusing tests on the elliptical mirror at the 1-km-long beamline of SPring-8. A full width at half maximum of 40 nm was achieved in the focal beam profile under the best focusing conditions.
Paper Details
Date Published: 18 October 2004
PDF: 8 pages
Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); doi: 10.1117/12.567501
Published in SPIE Proceedings Vol. 5533:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)
PDF: 8 pages
Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); doi: 10.1117/12.567501
Show Author Affiliations
Kazuto Yamauchi, Osaka Univ. (Japan)
Kazuya Yamamura, Osaka Univ. (Japan)
Hidekazu Mimura, Osaka Univ. (Japan)
Yasuhisa Sano, Osaka Univ. (Japan)
Satoshi Matsuyama, Osaka Univ. (Japan)
Hirokatsu Yumoto, Osaka Univ. (Japan)
Kazumasa Ueno, Osaka Univ. (Japan)
Kazuya Yamamura, Osaka Univ. (Japan)
Hidekazu Mimura, Osaka Univ. (Japan)
Yasuhisa Sano, Osaka Univ. (Japan)
Satoshi Matsuyama, Osaka Univ. (Japan)
Hirokatsu Yumoto, Osaka Univ. (Japan)
Kazumasa Ueno, Osaka Univ. (Japan)
Masafumi Shibahara, Hyogo Prefectural Institute of Technology (Japan)
Katsuyoshi Endo, Osaka Univ. (Japan)
Makina Yabashi, SPring-8/JASRI (Japan)
Kenji Tamasaku, SPring-8/RIKEN (Japan)
Yoshinori Nishino, SPring-8/RIKEN (Japan)
Tetsuya Ishikawa, SPring-8/JASRI (Japan)
SPring-8/RIKEN (Japan)
Yuzo Mori, Osaka Univ. (Japan)
Katsuyoshi Endo, Osaka Univ. (Japan)
Makina Yabashi, SPring-8/JASRI (Japan)
Kenji Tamasaku, SPring-8/RIKEN (Japan)
Yoshinori Nishino, SPring-8/RIKEN (Japan)
Tetsuya Ishikawa, SPring-8/JASRI (Japan)
SPring-8/RIKEN (Japan)
Yuzo Mori, Osaka Univ. (Japan)
Published in SPIE Proceedings Vol. 5533:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)
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