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Proceedings Paper

Tessellated probe as an aid to process development
Author(s): Neil M. P. Benjamin; K. R. Krieg; Gaylen T. Grover
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Paper Abstract

The tessellated probe is a large area single sided array of electrostatic probe elements arranged to simulate a wafer of 200mm diameter during processing within a plasma system. Various modes of operation are available including the standard negative DC bias for ion saturation measurements. Total ion flux and spatial distribution can be measured, giving two very useful parameters for process development. Measurements can also be made in the presence of simultaneously applied RF bias.

Paper Details

Date Published: 1 January 1992
PDF: 9 pages
Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); doi: 10.1117/12.56656
Show Author Affiliations
Neil M. P. Benjamin, Lucas Labs. (United States)
K. R. Krieg, Lucas Labs. (United States)
Gaylen T. Grover, Lucas Labs. (United States)

Published in SPIE Proceedings Vol. 1594:
Process Module Metrology, Control and Clustering
Cecil J. Davis; Irving P. Herman; Terry R. Turner, Editor(s)

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