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Proceedings Paper

Adaptive photolithography control using development time manipulation
Author(s): Robert A. Soper; Duncan A. Mellichamp; Dale E. Seborg
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Paper Abstract

A closed-loop adaptive control technique for photolithography is proposed and evaluated. In this strategy, development time is manipulated in order to keep the output critical dimension at a desired value, despite the disruptive effects of unmeasured process disturbances. The adaptive control strategy incorporates a three parameter reduced-order model of the photolithography process, a parameter estimator, and a nonlinear model-inversion controller. Simulation studies show that the adaptive controller is able to reject the detrimental effects of process disturbances and bring the critical dimension back to its desired value. In the simulations, PROLITH was used to represent the real lithography process.

Paper Details

Date Published: 1 January 1992
PDF: 11 pages
Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); doi: 10.1117/12.56642
Show Author Affiliations
Robert A. Soper, Univ. of California/Santa Barbara (United States)
Duncan A. Mellichamp, Univ. of California/Santa Barbara (United States)
Dale E. Seborg, Univ. of California/Santa Barbara (United States)

Published in SPIE Proceedings Vol. 1594:
Process Module Metrology, Control and Clustering
Cecil J. Davis; Irving P. Herman; Terry R. Turner, Editor(s)

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