Share Email Print

Proceedings Paper

Pulsed laser deposition of ZnO: comparison between deposition from Zn and ZnO target
Author(s): Jaroslav Bruncko; Miroslav Michalka; Frantisek Uherek
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

ZnO thin layers are promising materials for near UV emission and absorption optical devices, mainly for its relatively wide band gap (3.4 eV at 4.2 K). However, the problems with the optimal growth of the ZnO thin layer depositions are not satisfactory solved. The aim of this study was to compare differences between the layers deposited from the pure Zn target and the target from sintered ZnO. The growth of ZnO thin layers was performed on sapphire substrate under various conditions. The layers were prepared by the pulsed laser deposition using THG Nd:YAG laser at 355 nm. Characteristics of the layers were examined using the methods of atomic force microscopy, scanning electron microscopy and energy dispersive x-ray microanalyses.

Paper Details

Date Published: 21 June 2004
PDF: 6 pages
Proc. SPIE 5449, Eighth International Conference on Laser and Laser Information Technologies, (21 June 2004); doi: 10.1117/12.563094
Show Author Affiliations
Jaroslav Bruncko, International Laser Ctr. (Slovak Republic)
Miroslav Michalka, International Laser Ctr. (Slovak Republic)
Frantisek Uherek, International Laser Ctr. (Slovak Republic)

Published in SPIE Proceedings Vol. 5449:
Eighth International Conference on Laser and Laser Information Technologies
Vladislav Ya. Panchenko; Nikola V. Sabotinov, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?