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Proceedings Paper

Hard X-ray multilayer coated astronomical mirrors by e-beam deposition
Author(s): Daniele Spiga; Giovanni Pareschi; Gabriele Grisoni; Giuseppe Valsecchi
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Paper Abstract

A number of X-ray astronomical missions of near future (Constellation-X, XEUS, Simbol-X) will make use of hard X-rays (10-100 keV) optics with broad-band multilayer coatings. A possible technique under development is based on an extension of the already tested replication of a coated mandrel by e-beam deposition and nickel electroforming already successfully used for the soft (0.1 - 10 keV) X-ray mirrors of the Beppo-SAX, XMM, JET-X/Swift missions. In this case graded multilayers are deposited and replicated from the mandrel replicated instead of a single layer. The roughness reduction in order to improve the coating reflectivity could be achieved by an ion assistance during the e-beam deposition. The e-beam deposition with ion assistance is a technique that allows to reach comparable (if not better) smoothness levels with respect to other methods (e.g. ion sputtering), taking the advantage of a stress mitigation between the layers and of a further improvement in reflectivity due to the low density of the e-beam evaporated Carbon, which is used as bilayer spacer. In this paper we discuss the adopted deposition technique and its implementation: we present topographic (AFM) tests and X-ray reflectivity tests performed on preliminary samples.

Paper Details

Date Published: 18 October 2004
PDF: 9 pages
Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); doi: 10.1117/12.562085
Show Author Affiliations
Daniele Spiga, Univ. degli Studi di Milano-Bicocca (Italy)
INAF, Osservatorio Astronomico di Brera (Italy)
Giovanni Pareschi, INAF, Osservatorio Astronomico di Brera (Italy)
Gabriele Grisoni, Media Lario S.r.l. (Italy)
Giuseppe Valsecchi, Media Lario S.r.l. (Italy)

Published in SPIE Proceedings Vol. 5533:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)

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