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Proceedings Paper

Tantalum zone plates for scanning x-ray microscopy between 0.5 and 2.5 keV
Author(s): Timm Weitkamp; Olivier Dhez; Burkhard Kaulich; Christian David
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Paper Abstract

In the framework of TWINMIC, a project for the development of a multipurpose compact X-ray microscopy station capable of both scanning and full-field imaging, fabrication methods for tantalum zone plates are being developed at the Laboratory for Micro- and Nanotechnology of the Paul Scherrer Institut. Tantalum is deposited on supporting silicon or silicon nitride membranes by magnetron sputtering. The zone-plate patterns are transferred into the tantalum layer by reactive ion etching. Electron-beam lithography with continuous path control using a Leica LION LV1 e-beam machine has been used to make zone plates with diameters between 250 and 500 μm and thicknesses between 200 and 300 nm, all with an outermost zone width of 80 nm.

Paper Details

Date Published: 4 November 2004
PDF: 5 pages
Proc. SPIE 5539, Design and Microfabrication of Novel X-Ray Optics II, (4 November 2004); doi: 10.1117/12.559704
Show Author Affiliations
Timm Weitkamp, Paul Scherrer Institut (Switzerland)
Olivier Dhez, European Synchrotron Radiation Facility (France)
Burkhard Kaulich, ELETTRA Sincrotrone Trieste S.C.p.A. (Italy)
Christian David, Paul Scherrer Institut (Switzerland)

Published in SPIE Proceedings Vol. 5539:
Design and Microfabrication of Novel X-Ray Optics II
Anatoly A. Snigirev; Derrick C. Mancini, Editor(s)

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