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Proceedings Paper

Nanofabrication of nanopattern and microdevices using contact/proximity lithography
Author(s): Yung-Chiang Ting; Shyi-Long Shy; Ming-Chun Lee; Bau-Tong Dai
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Paper Abstract

The oldest lithography technique contact/proximity printing are widely used for research activity, most MEMS, Bio-Chip and Optical Electro devices can be fabricated by this method. In this paper, deep submicron 1x mask can be fabricated easily by using e-beam exposure, chemically amplified resist (CAR) and Cr dry etching, a chemical shrink method using dry/wet etching technology was proposed for nanofabrication by using Cr film as hard mask. Micro channel for biochip as well as micro lens for Optical Electro devices can easily be fabricated on glass and quartz substrates by this method.

Paper Details

Date Published: 20 August 2004
PDF: 7 pages
Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557750
Show Author Affiliations
Yung-Chiang Ting, Far East College (Taiwan)
Shyi-Long Shy, National Nano Device Labs. (Taiwan)
Ming-Chun Lee, Far East College (Taiwan)
Bau-Tong Dai, National Nano Device Labs. (Taiwan)

Published in SPIE Proceedings Vol. 5446:
Photomask and Next-Generation Lithography Mask Technology XI
Hiroyoshi Tanabe, Editor(s)

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