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Proceedings Paper

Surface organic compound contamination as a significant factor in substrate transmittance reduction in the VUV region
Author(s): Kyoko Sakai; Yo Sakata; Yuichi Fukushima; Yasuhiro Okumoto
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Paper Abstract

Organic compound contamination in a clean room is presently attracting attention as a serious problem in F2 laser lithography. Certain organic compounds may possibly have absorption spectra in the vacuum ultra violet region (VUV), as has been indicated by various theoretical considerations. But the effects of organic compounds present on a substrate surface are as yet unclarified. This study was conducted to determine whether organic compounds on the surface of a substrate serve significantly to reduce the transmittance of the substrate. The substrates of F-doped SiO2 glass and MgF2 were made to adsorb organic compounds by two different methods. Transmittance was measured at 130 to 200nm and clearly found to decrease as a result of organic compound contamination. In the case of dry-cleaned substrates, transmittance was recovered to its original level. It thus follows from these findings that substrate transmittance is significantly reduced by organic compound contamination on the substrate surface in the VUV region.

Paper Details

Date Published: 20 August 2004
PDF: 10 pages
Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557722
Show Author Affiliations
Kyoko Sakai, Toppan Printing Co., Ltd. (Japan)
Yo Sakata, Toppan Printing Co., Ltd. (Japan)
Yuichi Fukushima, Toppan Printing Co., Ltd. (Japan)
Yasuhiro Okumoto, Toppan Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 5446:
Photomask and Next-Generation Lithography Mask Technology XI
Hiroyoshi Tanabe, Editor(s)

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