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Proceedings Paper

Macroporous silicon-based polarization components
Author(s): Vladimir Kochergin; Marc Christophersen; Philip R. Swinehart
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Paper Abstract

Currently used transmission-type polarizers exhibit strong limitations in the deep UV and shorter wavelength. We propose an entirely different type of polarizer to solve many of the problems caused by the absence of adequate materials in this spectral range. The new polarizers consist of three-dimensionally ordered Macroporous Silicon (MPSi), with the pores used as waveguide cores separated by the reflective silicon host. Ordered pores serve as a two-dimensional array of optical waveguides. Multilayer coating of the pore walls, together with the rectangular shape of the pores (with the length along one axis being several times greater than that of the second axis) results in polarized transmission. Calculations demonstrate potentially very high extinction. In addition, the extinction achieved by such polarization components does not exhibit degradation with the angle of incidence, permitting operation in tilted and divergent light beams to simplify optical system design and fabrication. The fabrication process is different from that used in the fabrication of multilayer interference filters. It permits the fabrication of deep UV polarizers up to 200mm in diameter, suitable for wavelengths from above 600nm to less than 50nm. Far-UV polarizers can be manufactured as simply and economically as the near UV ones. The theory of light propagation through such MPSi layers is developed, the main predictions of the theory are experimentally validated, and the fabrication procedure for MPSi UV polarizers is described.

Paper Details

Date Published: 8 October 2004
PDF: 10 pages
Proc. SPIE 5515, Nanoengineering: Fabrication, Properties, Optics, and Devices, (8 October 2004); doi: 10.1117/12.557397
Show Author Affiliations
Vladimir Kochergin, Lake Shore Cryotronics, Inc. (United States)
Marc Christophersen, Lake Shore Cryotronics, Inc. (United States)
Philip R. Swinehart, Lake Shore Cryotronics, Inc. (United States)

Published in SPIE Proceedings Vol. 5515:
Nanoengineering: Fabrication, Properties, Optics, and Devices
Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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