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Proceedings Paper

Lithographic fabrication of microstructures by laser ablation using femtosecond laser
Author(s): Yoshiki Nakata; Tatsuo Okada; Mitsuo Maeda
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Paper Abstract

Photo-lithographical laser ablation was demonstrated by laser ablation using a femtosecond laser system with a lithographic optical system. Among them, laser beam passed through a mask and the pattern was imaged on the film by a pair of convex lenses. As a result, the film was lithographically ablated, and micron-sized patterns were generated in a single shot. Fringes were generated outside the ablated patterns with defocusing or larger laser fluence. The resolution of generation was 13 μm, and the narrowest width of a generated line was about 4 μm. In addition, transmission gratings were used instead of a mask, and nano-sized periodic structures were generated.

Paper Details

Date Published: 2 April 2004
PDF: 9 pages
Proc. SPIE 5399, Laser-Assisted Micro- and Nanotechnologies 2003, (2 April 2004); doi: 10.1117/12.552809
Show Author Affiliations
Yoshiki Nakata, Kyushu Univ. (Japan)
Tatsuo Okada, Kyushu Univ. (Japan)
Mitsuo Maeda, Kyushu Univ. (Japan)

Published in SPIE Proceedings Vol. 5399:
Laser-Assisted Micro- and Nanotechnologies 2003
Vadim P. Veiko, Editor(s)

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