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Proceedings Paper

A high-power short-pulse laser for EUV source generation using laser-produced plasma and achieving low cost of ownership
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Paper Abstract

Powerlase has made significant advances towards making the LPP EUV source the most likely choice for a full production EUV lithography machine. Our main achievement was enhancing the performance of the LPP driver and particularly increasing the average power per laser module. This was achieved by increasing the electrical to optical conversion efficiency of our gain modules. In order to increase the conversion efficiency of the in-band EUV, we are currently using cryogenic solid xenon, as well as other target materials. The combination of an efficient and cost effective laser driver with appropriate choice of target material significantly lowers the Cost of Ownership (CoO) of the LPP EUV source, including day to day running, making it comparable to the cost of Discharge Produced Plasma (DPP) sources.

Paper Details

Date Published: 20 September 2004
PDF: 10 pages
Proc. SPIE 5448, High-Power Laser Ablation V, (20 September 2004); doi: 10.1117/12.549228
Show Author Affiliations
Andy J. Comley, Powerlase Ltd. (United Kingdom)
Samir Ellwi, Powerlase Ltd. (United Kingdom)
Nick Hay, Powerlase Ltd. (United Kingdom)
Michael F. Brownell, Powerlase Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 5448:
High-Power Laser Ablation V
Claude R. Phipps, Editor(s)

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