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Proceedings Paper

MEMS tunable filter for telecom applications
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Paper Abstract

We report on an angle-tunable oblique incidence resonant grating filter that can be used to drop individual channels from the C-band for incident TE-polarized light. For tuning purpose, the filter is glued onto a tiltable platform of a MEMS device. Continues scanning of the platform allows to monitor channel presence and power. The reflected wavelength is tuned by changing the angle of incidence of the resonant grating filter, which is composed of two thin films with a grating pattern on top of it. The first layer on a glass substrate acts as a waveguide, and the second layer separates the waveguide from the grating. The grating has been patterned by holographic recording and dry etching. The filter works over a wavelength range of 1520-1580 nm and its response has a Lorentian shape with 0.5 nm FWHM peak width. The MEMS part is based on SOI technology and is processed in only two DRIE steps. The platform measures 2 x 2 mm2 with a through-hole of 1.6 x 1.8 mm2 for light transmission. Two arrays of combs attached to the platform as well as a set of four static combs are used to electrostatically incline the platform by ± 4° with a driving voltage of about 60 V.

Paper Details

Date Published: 16 August 2004
PDF: 12 pages
Proc. SPIE 5455, MEMS, MOEMS, and Micromachining, (16 August 2004); doi: 10.1117/12.545581
Show Author Affiliations
Thomas Overstolz, IMT, Univ. de Neuchatel (Switzerland)
Guido Niederer, IMT, Univ. de Neuchatel (Switzerland)
Wilfried Noell, IMT, Univ. de Neuchatel (Switzerland)
Michael T. Gale, Ctr. Suisse d'Electronique et de Microtechnique SA (Switzerland)
Hans Peter Herzig, IMT, Univ. de Neuchatel (Switzerland)
Samuel Obi, Ctr. Suisse d'Electronique et de Microtechnique SA (Switzerland)
Hans Thiele, Ctr. Suisse d'Electronique et de Microtechnique SA (Switzerland)
Nicolaas F. de Rooij, IMT, Univ. de Neuchatel (Switzerland)

Published in SPIE Proceedings Vol. 5455:
MEMS, MOEMS, and Micromachining
Hakan Urey; Ayman El-Fatatry, Editor(s)

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