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Proceedings Paper

Scattering and emission polarization simulation for simple objects
Author(s): Changhyuk An; Kyle J. Zeringue
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Paper Abstract

We have developed a scattering and emission polarization model. The scattering model is based on the vector Kirchhoff diffraction equation. For the emission polarization model, we use the Kirchhoff law for opaque materials, where the directional emissivity is assumed to be the same as Fresnel parallel and perpendicular transmittance. It is assumed that the emitted radiation from each facet has no relation with the radiation from neighboring facets. The roughness of the surface is treated statistically using the rms roughness height and the autocorrelation length. A Gaussian distribution is assumed for the roughness facet normal vectors. Shadowing by neighboring facets is also included in the model. We compute look-up tables for the scattering Mueller matrix and emission Stokes parameters for all incident and scattering (or emission) angles. The look-up tables are used for simulating the scattering and emission polarization signatures of objects. Polarization images of scattering, self-emission, and combination of scattering and emission are studied for Aluminum objects of various roughnesses and for various wavebands. The results show that the surface roughness is an important factor to determine the intensity and polarization. Our simulation results agree with polarization field data in that solar reflection has larger cancellation effect on MW IR polarization signatures than LW IR.

Paper Details

Date Published: 15 July 2004
PDF: 12 pages
Proc. SPIE 5432, Polarization: Measurement, Analysis, and Remote Sensing VI, (15 July 2004); doi: 10.1117/12.543492
Show Author Affiliations
Changhyuk An, Photon Research Associates, Inc. (United States)
Kyle J. Zeringue, Photon Research Associates, Inc. (United States)

Published in SPIE Proceedings Vol. 5432:
Polarization: Measurement, Analysis, and Remote Sensing VI
Dennis H. Goldstein; David B. Chenault, Editor(s)

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