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Proceedings Paper

Spectroscopic studies of the Sn-based droplet laser plasma EUV source
Author(s): Chiew-Seng Koay; Kazutoshi Takenoshita; Etsuo Fujiwara; Moza M. Al-Rabban; Martin C. Richardson
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Paper Abstract

We have previously reported encouraging results with a new type of laser plasma source. As a radiation source at 13.5nm spectral band, tin has several advantages over xenon, not the least of which is the number of ion species within the plasma that contribute to the in-band emission. In this paper we report results from spectroscopic measurements of the laser plasma emission from 12 - 19nm from this target, together with hydrodynamic code simulations of the source, towards developing a suitable laser plasma source for EUV lithography.

Paper Details

Date Published: 20 May 2004
PDF: 7 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.541575
Show Author Affiliations
Chiew-Seng Koay, CREOL/FPCE/Univ. of Central Florida (United States)
Kazutoshi Takenoshita, CREOL/FPCE/Univ. of Central Florida (United States)
Etsuo Fujiwara, Himeji Institute of Technology (Japan)
Moza M. Al-Rabban, Qatar Univ. (Qatar)
Martin C. Richardson, CREOL/FPCE/Univ. of Central Florida (United States)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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