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Proceedings Paper

Compact electron-based EUV source
Author(s): Andre Egbert; Boris Tkachenko; Andreas Ostendorf; Stefan Becker; Boris N. Chichkov
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Paper Abstract

A compact extreme ultraviolet (EUV) source for metrology is developed. This source is based on an extension of conventional x-ray tube technology into the EUV spectral range. As in an ordinary x-ray tube, electrons are generated by a filament, accelerated in a high-voltage electric field toward an anode, and focused onto a solid target. In this "EUV tube" silicon targets are used to generate radiation at 13.5 nm. Absolute conversion efficiencies from electrons into EUV photons are measured. Illustrations of spectral and spatial properties are given and investigations of the long-term stability of the EUV emission are performed. Possibilities for a power scaling into the milliwatt range are discussed.

Paper Details

Date Published: 18 November 2003
PDF: 4 pages
Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); doi: 10.1117/12.540546
Show Author Affiliations
Andre Egbert, Laser Zentrum Hannover e.V. (Germany)
Boris Tkachenko, Laser Zentrum Hannover e.V. (Germany)
Andreas Ostendorf, Laser Zentrum Hannover e.V. (Germany)
Stefan Becker, phoenix|x-ray Systems + Services GmbH (Germany)
Boris N. Chichkov, Laser Zentrum Hannover e.V. (Germany)

Published in SPIE Proceedings Vol. 5063:
Fourth International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Andreas Ostendorf; Koji Sugioka; Henry Helvajian, Editor(s)

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