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Proceedings Paper

Comparison between the atomic force microscopy and x-ray reflectivity on the characterization of the roughness of a surface
Author(s): Hui-Chia Su; Ming-Zhe Lin; Tzu-Wen Huang; Chih-Hao Lee
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Paper Abstract

X-ray reflectivity and atomic force microscopy are two common tools in characterizing the surface roughness. However, the measurement results reported by these two methods were usually not consistent between each other. In this work, polished sapphire wafers with different surface roughness were prepared and measured by both methods. To understand the disagreement, a possible interpretation for X-ray reflectivity and atomic force microscopy on the characterization of the surface roughness is described. The difference in the X-ray reflectivity measurement, the X-ray beam covers a larger area of few mm2 on the sample, while the atomic force microscopy probes only a local area (around μm2). In general, the surface roughness measured by atomic force microscopy should be smoother than that obtained by X-ray reflectivity due to the convolution of tip shape of atomic force microscopy and the short wavelength of probing X-rays. However, the surface contamination of the sample and the atomic force microscopy environment complicate the measurements for both methods, especially, for these samples with root-mean-square roughness less than 1 nm.

Paper Details

Date Published: 21 July 2004
PDF: 9 pages
Proc. SPIE 5392, Testing, Reliability, and Application of Micro- and Nano-Material Systems II, (21 July 2004); doi: 10.1117/12.539761
Show Author Affiliations
Hui-Chia Su, National Tsing Hua Univ. (Taiwan)
Ming-Zhe Lin, National Tsing Hua Univ. (Taiwan)
Tzu-Wen Huang, National Tsing Hua Univ. (Taiwan)
Chih-Hao Lee, National Tsing Hua Univ. (Taiwan)

Published in SPIE Proceedings Vol. 5392:
Testing, Reliability, and Application of Micro- and Nano-Material Systems II
Norbert Meyendorf; George Y. Baaklini; Bernd Michel, Editor(s)

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