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Proceedings Paper

Presculpting of photoresists using additive lithography
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Paper Abstract

In this paper we present the fabrication of refractive micro optical elements by additive sculpting of the photoresist using binary amplitude masking techniques. We also present the fabrication of micro optical elements by pre sculpting the photoresist before reflow. This enables the use of fewer masking patterns while allowing us to obtain smooth profiles on the resist. The resist can be pre sculpted into any shape by using a set of binary patterns thus allowing us to fabricate refractive beam shaping elements.

Paper Details

Date Published: 29 December 2003
PDF: 10 pages
Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); doi: 10.1117/12.538385
Show Author Affiliations
Mahesh Pitchumani, CREOL/Univ. of Central Florida (United States)
Waleed S. Mohammed, CREOL/Univ. of Central Florida (United States)
Heidi Hockel, CREOL/Univ. of Central Florida (United States)
Eric G. Johnson, CREOL/Univ. of Central Florida (United States)


Published in SPIE Proceedings Vol. 5347:
Micromachining Technology for Micro-Optics and Nano-Optics II
Eric G. Johnson; Gregory P. Nordin, Editor(s)

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