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Proceedings Paper

Novel transparent PAGs for 193-nm resists
Author(s): Kunihiko Kodama; Kenichiro Sato; Shiro Tan; Fumiyuki Nishiyama; Tsukasa Yamanaka; Shinichi Kanna; Hyou Takahashi; Yasumasa Kawabe; Makoto Momota; Tadayoshi Kokubo
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Paper Abstract

Transparency of the resist film at exposure wavelength affects lithographic performances, such as sensitivity, profile and resolution. Not only binder polymer, but also photo acid generator (PAG) itself has a significant impact on transparency of the formulated resist. Triphenylsulfonium salt (TPS) or Diphenyliodonium salt (DPI) have been widely used as PAGs in DUV chemically amplified (CA) resists, however, aromatic groups there have strong absorption at 193nm and thereby these PAGs have to suffer from low transparency. In this paper, we will report a novel class of transparent enone sulfonium salt PAGs(ENS-PAG), which we believe useful for 193nm resist. The ENS-PAGs do not have any aromatic groups but have an α,β-unsaturated ketone structure for the absorbing moiety in the backbone. These PAGs showed excellent transparency, thermal stability, and demonstrated an advantage in the line edge roughness (LER).

Paper Details

Date Published: 14 May 2004
PDF: 8 pages
Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); doi: 10.1117/12.538049
Show Author Affiliations
Kunihiko Kodama, Fuji Photo Film Co., Ltd. (Japan)
Kenichiro Sato, Fuji Photo Film Co., Ltd. (Japan)
Shiro Tan, Fuji Photo Film Co., Ltd. (Japan)
Fumiyuki Nishiyama, Fuji Photo Film Co., Ltd. (Japan)
Tsukasa Yamanaka, Fuji Photo Film Co., Ltd. (Japan)
Shinichi Kanna, Fuji Photo Film Co., Ltd. (Japan)
Hyou Takahashi, Fuji Photo Film Co., Ltd. (Japan)
Yasumasa Kawabe, Fuji Photo Film Co., Ltd. (Japan)
Makoto Momota, FUJIFILM Arch Co., Ltd. (Japan)
Tadayoshi Kokubo, FUJIFILM Arch Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 5376:
Advances in Resist Technology and Processing XXI
John L. Sturtevant, Editor(s)

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