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Proceedings Paper

Initial assessment of the lithographic impact of the use of hard pellicles: an overview
Author(s): Peter De Bisschop; Michael K. Kocsis; Richard Bruls; Andrew Grenville; Chris Van Peski
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Paper Abstract

We have made an experimental study of the use of Hard Pellicles in Optical Lithography. The goal of this work was to verify whether Hard Pellicles could be a viable alternative when soft (organic) pellicle material is not available, as is currently the case in 157 nm lithography. In our study we have compared scanner performance and lithographic results obtained with Hard Pellicles vs. the results without. Most of this work was actually done on a 193 nm scanner; only recently we started a pellicle-purging investigation on a 157 nm scanner. This part of the work is still ongoing. The results obtained so far are positive - we basically found no difference between the with-Hard-Pellicle results vs. the without-Hard-Pellicle results - and have not yielded any lithographic show stopper for their use in production. This paper presents a brief overview of the currently available results.

Paper Details

Date Published: 28 May 2004
PDF: 8 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.537530
Show Author Affiliations
Peter De Bisschop, IMEC (Belgium)
Michael K. Kocsis, IMEC (Belgium)
Intel Corp. (United States)
Richard Bruls, ASML (Netherlands)
Andrew Grenville, International SEMATECH (United States)
Intel Corp. (United States)
Chris Van Peski, International SEMATECH (United States)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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