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Proceedings Paper

Four-inch photocurable nanoimprint lithography using NX-2000 nanoimprinter
Author(s): Mingtao Li; Hua Tan; Linshu Kong; Larry Koecher
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Paper Abstract

Photo-curable nanoimprint lithography (P-NIL), a low pressure and room temperature process, is developed on Nanonex NX-2000 nanoimprintor. The process is capable of achieving uniform imprinting over large area in less than 60 seconds, which is mainly attributed to the Nanonex patented air cushion press (ACP) technology. Nanostructures such as 200nm pitch grating have been successfully demonstrated on 4-inch wafer level using P-NIL on NX-2000 nanoimprintor.

Paper Details

Date Published: 20 May 2004
PDF: 4 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.537232
Show Author Affiliations
Mingtao Li, Nanonex Corp. (United States)
Hua Tan, Nanonex Corp. (United States)
Linshu Kong, Nanonex Corp. (United States)
Larry Koecher, Nanonex Corp. (United States)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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