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Proceedings Paper

Nikon projection lens update
Author(s): Tomoyuki Matsuyama; Toshiro Ishiyama; Yasuhiro Omura
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Paper Abstract

This paper describes various kinds of technological improvements in ArF projection lenses for success in very low-k1 and high NA lithography. This paper covers optical design, lens manufacturing, aberration characterization, aberration manipulation, flare control, and linear polarizing illumination. Actual lens performance of the Nikon NSR-S307E (0.85NA ArF Optics) is also reviewed.

Paper Details

Date Published: 28 May 2004
PDF: 12 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.537206
Show Author Affiliations
Tomoyuki Matsuyama, Nikon Corp. (Japan)
Toshiro Ishiyama, Nikon Corp. (Japan)
Yasuhiro Omura, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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