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Proceedings Paper

Manufacturing concerns for advanced CMOS circuit realization EBDW alternative solution for cost and cycle time reductions
Author(s): Laurent Pain; M. Jurdit; Yves T. LaPlanche; J. Todeschini; Serdar Manakli; G. Bervin; Ramiro Palla; A. Beverina; R. Faure; X. Bossy; H. Leininger; S. Tourniol; M. Broekaart; F. Judong; K. Brosselin; P. Gouraud; Veronique De Jonghe; Daniel Henry; M. Woo; Peter Stolk; B. Tavel; F. Arnaud
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Paper Abstract

The introduction of Electron Beam Direct Write lithography into production represents a challenging alternative to reduce cost and cycle time increase induced by the introduction of new generation nodes. This paper details the development work performed to insert transparently direct write lithography process and alignment strategies into CMOS process flows. Finally, this interchangeability between E-Beam and optical lithography steps offers a complete flexibility for device architecture validation and allowed the development of a complete low cost 65nm platform including low-power and general-purpose applications.

Paper Details

Date Published: 20 May 2004
PDF: 11 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.537188
Show Author Affiliations
Laurent Pain, CEA-LETI (France)
M. Jurdit, CEA-LETI (France)
Yves T. LaPlanche, STMicroelectronics (France)
J. Todeschini, Philips Semiconductors (France)
Serdar Manakli, STMicroelectronics (France)
G. Bervin, Motorola, Inc. (France)
Ramiro Palla, STMicroelectronics (France)
A. Beverina, STMicroelectronics (France)
R. Faure, STMicroelectronics (France)
X. Bossy, STMicroelectronics (France)
H. Leininger, STMicroelectronics (France)
S. Tourniol, STMicroelectronics (France)
M. Broekaart, Philips Semiconductors (France)
F. Judong, STMicroelectronics (France)
K. Brosselin, STMicroelectronics (France)
P. Gouraud, STMicroelectronics (France)
Veronique De Jonghe, Philips Semiconductors (France)
Daniel Henry, STMicroelectronics (France)
M. Woo, Motorola, Inc. (France)
Peter Stolk, Philips Semiconductors (France)
B. Tavel, Philips Semiconductors (France)
F. Arnaud, STMicroelectronics (France)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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