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Proceedings Paper

Total performance of Nikon EB stepper R&D tool
Author(s): Tomoharu Fujiwara; Noriyuki Hirayanagi; Jin Udagawa; Junji Ikeda; Sumito Shimizu; Hidekazu Takekoshi; Kazuaki Suzuki
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Paper Abstract

The development of Electron Projection Lithography (EPL) has proceeded for more than 10 years since its first description. EPL is regarded as a practical technology for 65 nm technology node and below. Nikon has been developing an EPL tool, named as the EB stepper. NSR-EB1A is the first EPL tool that has full functions for practical R&D use such as dynamic exposure by combination of electron beam deflection and stage scanning, wafer alignment, and so on. Some features of the EB stepper, which uses a 100 kV electron beam, are high resolution, and a large process margin associated with large depth of focus (DOF). Large DOF is a major feature of electron beam lithography. In the previous paper, we reported data of dynamic resolution and subfield stitching accuracy as preliminary performances that were obtained by NSR-EB1A. Recently the development of EPL reticle is significantly progressed. Today, high quality 200 mm diameter EPL reticle is available from plural mask suppliers. Using 200mm EPL reticle, we achieved subfield stitching accuracy about 20nm (3s). And we also evaluated total performance such as CD uniformity, overlay accuracy. This paper reports the latest performance of NSR-EB1A.

Paper Details

Date Published: 20 May 2004
PDF: 10 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.537008
Show Author Affiliations
Tomoharu Fujiwara, Nikon Corp. (Japan)
Noriyuki Hirayanagi, Nikon Corp. (Japan)
Jin Udagawa, Nikon Corp. (Japan)
Junji Ikeda, Nikon Corp. (Japan)
Sumito Shimizu, Nikon Corp. (Japan)
Hidekazu Takekoshi, Nikon Corp. (Japan)
Kazuaki Suzuki, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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