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Proceedings Paper

Development of magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography
Author(s): Bruno S. Bauer; Roberto C. Mancini; Volodymyr Makhin; Ioana Paraschiv; Andrey Esaulov; Radu Presura; Irvin R. Lindemuth; Peter T. Sheehey; Bryan J. Rice
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Paper Abstract

A magnetohydrodynamic (MHD) model of gas discharges has been developed to accelerate the development of compact, intense sources of EUV radiation for microlithography. The model is an MHD numerical simulation with atomic and radiation physics. The plasma evolution is simulated with the MHRDR (Magneto-Hydro-Radiative-Dynamic-Research) 2D, three-temperature, MHD computer code. The MHD results are postrocessed witha code that caluculated the radiation spectrum from Xe ions, including 13.4-nm EUV output, based on a detailed collisional-radiative atomic kinetics model. A variety of gas discharges relevant to microlithography can be modeled with this new tool.

Paper Details

Date Published: 20 May 2004
PDF: 11 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.536289
Show Author Affiliations
Bruno S. Bauer, Univ. of Nevada/Reno (United States)
Roberto C. Mancini, Univ. of Nevada/Reno (United States)
Volodymyr Makhin, Univ. of Nevada/Reno (United States)
Ioana Paraschiv, Univ. of Nevada/Reno (United States)
Andrey Esaulov, Univ. of Nevada/Reno (United States)
Radu Presura, Univ. of Nevada/Reno (United States)
Irvin R. Lindemuth, Los Alamos National Lab. (United States)
Peter T. Sheehey, Los Alamos National Lab. (United States)
Bryan J. Rice, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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