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Proceedings Paper

Layout decompression chip for maskless lithography
Author(s): Borivoje Nikolic; Ben Wild; Vito Dai; Yashesh A. Shroff; Benjamin Warlick; Avideh Zakhor; William G. Oldham
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Paper Abstract

Future maskless lithography systems require data throughputs of the order of tens of terabits per second in order to have comparable performance to today’s mask-based lithography systems. This work presents an approach to overcome the throughput problem by compressing the layout data and decompressing it on the chip that interfaces to the writers. To achieve the required throughput, many decompression paths have to operate in parallel. The concept is demonstrated by designing an interface chip for layout decompression, consisting of a Huffman decoder and a Lempel-Ziv systolic decompressor. The 5.5mm x 2.5mm prototype chip, implemented in a 0.18μm, 1.8V CMOS process is fully functional at 100MHz dissipating 30mW per decompression row. By scaling the chip size up and implementing it in a 65nm technology, the decompressed data throughput required for writing 60 wafers per hour in 45nm technology is feasible.

Paper Details

Date Published: 20 May 2004
PDF: 8 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.535878
Show Author Affiliations
Borivoje Nikolic, Univ. of California/Berkeley (United States)
Ben Wild, Univ. of California/Berkeley (United States)
Vito Dai, Univ. of California/Berkeley (United States)
Yashesh A. Shroff, Univ. of California/Berkeley (United States)
Benjamin Warlick, Univ. of California/Berkeley (United States)
Avideh Zakhor, Univ. of California/Berkeley (United States)
William G. Oldham, Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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