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Proceedings Paper

Airborne molecular contamination control in the micromirror SLM-based deep ultraviolet DUV SIGMA7300 laser pattern generator
Author(s): Mats Ekberg; Hans A. Fosshaug; Thomas Ostrom; Peter Bjornangen; Thomas Utterback; Per-Uno Skotte; John Higley; David Ruede; Oleg P. Kishkovich
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Paper Abstract

Airborne molecular contamination (AMC) in the form of bases, acids and condensable organic and inorganic substances threaten both costly and sensitive optics and mask pattern formation in the chemically amplified resists (CAR) used for both E-beam and laser lithography. This is particularly so for mask pattern generators due to the relatively long writing times. In the development work of the SLM-based DUV-laser mask pattern generator Sigma7300, AMC aspects have been taken into consideration from an early stage. That includes e.g. analysis and selection of construction materials and development of handling methods as well as application of chemical filtering systems. Tool manufacturer and filter supplier have together specified and designed efficient hybrid filtration systems for use in Sigma7300. This paper describes AMC aspects specific for mask pattern generators, the successful design actions of the Sigma7300 and verifying analyses of the processes.

Paper Details

Date Published: 28 May 2004
PDF: 15 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.535833
Show Author Affiliations
Mats Ekberg, Micronic Laser Systems AB (Sweden)
Hans A. Fosshaug, Micronic Laser Systems AB (Sweden)
Thomas Ostrom, Micronic Laser Systems AB (Sweden)
Peter Bjornangen, Micronic Laser Systems AB (Sweden)
Thomas Utterback, Micronic Laser Systems AB (Sweden)
Per-Uno Skotte, Micronic Laser Systems AB (Sweden)
John Higley, Extraction Systems, Inc. (United States)
David Ruede, Extraction Systems, Inc. (United States)
Oleg P. Kishkovich, Extraction Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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