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Proceedings Paper

Fast algorithm for extraction of worst-case image degradation due to flare
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Paper Abstract

Unwanted scattered light affects image-quality, OPC behavior and becomes increasingly problematic with decreasing wavelength. A software system has been written that incorporates a pattern-matching algorithm to locate regions in the mask geometry that closely resemble a problematic shape. Our goal is to improve manufacturing of a full-chip layout by identifying locations worst impacted by flare. The Pattern Matcher match factor shows good agreement in predicting flare sensitivity for several flare measurement layouts. The software is able to generate and process patterns capturing short-range, mid-range and long-range flare effects.

Paper Details

Date Published: 28 May 2004
PDF: 8 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.535832
Show Author Affiliations
Scott J. Hafeman, Univ. of California/Berkeley (United States)
Frank Gennari, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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