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Proceedings Paper

Long-term reliable operation of a MOPA-based ArF light source for microlithography
Author(s): Toshihiko Ishihara; Herve Besaucele; Cynthia A. Maley; Vladimir B. Fleurov; Patrick O'Keeffe; Mary E. Haviland; Richard G. Morton; Walter D. Gillespie; Timothy S. Dyer; Bryan Moosman; Robert Poole
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Paper Abstract

Since the introduction of the XLA-100 in January 2003, we have built, tested, and shipped a large number of XLA-100 MOPA lasers to microlithography scanner manufacturers. Some systems have already been installed at chip fabrication lines. To ensure product design robustness, we have been performing a long-term system performance test of an XLA-100 laser at Cymer. In this paper, we will report optical performance of the XLA-100 we see during manufacturing final tests, and a summary of the long term testing.

Paper Details

Date Published: 28 May 2004
PDF: 8 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.535614
Show Author Affiliations
Toshihiko Ishihara, Cymer, Inc. (United States)
Herve Besaucele, Cymer, Inc. (United States)
Cynthia A. Maley, Cymer, Inc. (United States)
Vladimir B. Fleurov, Cymer, Inc. (United States)
Patrick O'Keeffe, Cymer, Inc. (United States)
Mary E. Haviland, Cymer, Inc. (United States)
Richard G. Morton, Cymer, Inc. (United States)
Walter D. Gillespie, Cymer, Inc. (United States)
Timothy S. Dyer, Cymer, Inc. (United States)
Bryan Moosman, Cymer, Inc. (United States)
Robert Poole, Cymer, Inc. (United States)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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