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Proceedings Paper

Optimization and characterization of the blazed phase grating focus monitoring technique
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Paper Abstract

The concept of developing a Two Beam interferometer through the use of a Blazed Phase Grating reticle design was introduced several years ago. Although this technique showed great promise and capability in the lab environment, introduction of this product into the manufacturing processes has been slow. We will introduce some of the newest findings and techniques that have allowed us to bring this technique into use in the day-to-day manufacturing environment. We will discuss advancements made in the design of the hardware elements and inspection routines, new detections analysis routines and integration techniques that have allowed us to introduce the Blazed Phase Grating into our R2R focus control. The results of this technique will be presented and we will show the correlation to our existing focus monitoring techniques as well as the sensitivities to processing effects on the determined best Focus Values. We will attempt to show some of the imaging hardware effects on printed best focus, including the effects of scan direction as well as the introducing a monitoring technique used for determining wafer and e-chuck flatness.

Paper Details

Date Published: 28 May 2004
PDF: 11 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.535332
Show Author Affiliations
William R. Roberts, Infineon Technologies AG (United States)
Gerhard Kunkel, Infineon Technologies AG (Germany)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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