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Proceedings Paper

Cost of ownership reduction for OPC development and production
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Paper Abstract

The cost of developing and deploying optical proximity correction (OPC) technology has become a non-negligible part of the total lithography cost of ownership (CoO). In this paper, we present our efforts to reduce costs associated with OPC in the development phase for the 90nm node, and production phase for the 130nm node.

Paper Details

Date Published: 28 May 2004
PDF: 9 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.535279
Show Author Affiliations
Chi-Min Yuan, Motorola (United States)
Bob Jarvis, Motorola (United States)
Kevin D. Lucas, Motorola (United States)
Robert Boone, Motorola (United States)
Ruiqi Tian, Motorola (United States)
Alfred Reich, Motorola (United States)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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