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Proceedings Paper

200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield
Author(s): Tadahiko Takikawa; Mikio Ishikawa; Satoshi Yusa; Yoshinori Kinase; Hiroshi Fujita; Morihisa Hoga; Naoya Hayashi; Hisatake Sano
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Paper Abstract

Electron beam projection lithography (EPL) has been developed for application to 65 nm node devices and beyond. 200-mm EPL masks have also been developed keeping pace with the exposure tool. Image placement (IP) accuracy is a necessary quality assurance item to bring masks into production. A suspension type electrostatic chuck designed for EPL mask measurement for an IP metrology tool Leica LMS IPRO was prepared for measurement of local IP errors, defined for each subfiled. The chuck holds the mask on its membrane-side surface right side up. Three 200-mm stencil masks with tensile membrane stresses of 8, 18, and 43 MPa were fabricated. The IP error is found to increase as the stress increases. Marks in the area of a high pattern density with a void fraction of 0.2 moved toward the area of a low pattern density with a void fraction of 0.016. The IP errors did not strongly depend on the kinds of dummy patterns (either hole or L&S) having the same void fraction of 0.25 and macroscopic uniformity. If the stress is less than 10 MPa, the IP error (3 sigma) is less than 10 nm, satisfying the EPL mask requirement. Local CD accuracy was also evaluated for a mask with a membrane stress of 8 MPa.

Paper Details

Date Published: 20 May 2004
PDF: 13 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.535108
Show Author Affiliations
Tadahiko Takikawa, Dai Nippon Printing Co., Ltd. (Japan)
Mikio Ishikawa, Dai Nippon Printing Co., Ltd. (Japan)
Satoshi Yusa, Dai Nippon Printing Co., Ltd. (Japan)
Yoshinori Kinase, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Fujita, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)
Hisatake Sano, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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