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Proceedings Paper

Simulation and optimization of DPP hydrodynamics and radiation transport for EUV lithography devices
Author(s): Ahmed Hassanein; Valeryi Sizyuk; Vladimir Tolkach; Vitali Morozov; T. Sizyuk; Bryan J. Rice; Vivek Bakshi
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Paper Abstract

Discharge produced plasma (DPP) devices are being used as a light source for Extreme Ultraviolet (EUV) Lithography. A key challenge for DPP is achieving sufficient brightness to support the throughput requirements of exposure tools for high-volume manufacturing lithography. An integrated model is being developed to simulate the environment of the EUV source and optimize the output of the source. The model describes the hydrodynamic and optical processes that occur in DPP devices. It takes into account plasma evolution and magnetohydrodynamic processes as well as detailed photon radiation transport. The total variation diminishing scheme in the Lax-Friedrich formulation for the description of magnetic compression and diffusion in a cylindrical geometry is used. Several models are being developed for opacity calculations: a collisional radiation equilibrium model, a self-consistent field model with Auger processes, and a non-stationary kinetic model. Radiation transport for both continuum and lines with detailed spectral profiles is taken into account. The developed models are being integrated into the HEIGHTS-EUV computer simulation package. Preliminary results of a numerical simulation of xenon gas hydrodynamics and EUV radiation output are presented for various plasma conditions.

Paper Details

Date Published: 20 May 2004
PDF: 10 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.534269
Show Author Affiliations
Ahmed Hassanein, Argonne National Lab. (United States)
Valeryi Sizyuk, Argonne National Lab. (United States)
Vladimir Tolkach, Argonne National Lab. (United States)
Vitali Morozov, Argonne National Lab. (United States)
T. Sizyuk, Argonne National Lab. (United States)
Bryan J. Rice, Intel Corp. (United States)
Vivek Bakshi, International SEMATECH (United States)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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