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Proceedings Paper

Extending optical lithography with immersion
Author(s): Bob Streefkerk; Jan Baselmans; Wendy Gehoel-van Ansem; Jan Mulkens; Chris Hoogendam; Martin Hoogendorp; Donis G. Flagello; Harry Sewell; Paul Graupner
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Paper Abstract

As the semiconductor industry looks to the future to extend manufacturing beyond 100nm, ASML have developed a new implementation of an old optical method for lithography. Immersion lithography can support the aggressive industry roadmap and offers the ability to manufacture semiconductor devices at a low k1. In order to make immersion lithography a production worthy technology a number of challenges have to be overcome. This paper provides the results of our feasibility study on immersion lithography. We show through experimental and theoretical evaluation that we can overcome the critical concerns related to immersion lithography. We show results from liquid containment tests focussing on its effects on the scan speed of the system and the formation of micro-bubbles in the fluid. We present fluid-to-resist compatibility tests on resolution, using a custom-built interference setup. Ultimate resolution is tested using a home build 2 beam interference setup. ASML built a prototype full field scanning exposure system based on the dual stage TWINSCAN platform. It features a full field 0.75 NA refractive projection lens. We present experimental data on imaging and overlay.

Paper Details

Date Published: 28 May 2004
PDF: 21 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.534009
Show Author Affiliations
Bob Streefkerk, ASML (Netherlands)
Jan Baselmans, ASML (Netherlands)
Wendy Gehoel-van Ansem, ASML (Netherlands)
Jan Mulkens, ASML (Netherlands)
Chris Hoogendam, ASML (Netherlands)
Martin Hoogendorp, ASML (Netherlands)
Donis G. Flagello, ASML (United States)
Harry Sewell, ASML (United States)
Paul Graupner, Carl Zeiss (Germany)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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