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Proceedings Paper

Random aberration and local flare
Author(s): Masato Shibuya; Hiromi Ezaki; Toshihumi Fukui; Nobuaki Watanabe; Akira Nishikata
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Paper Abstract

Recently, in optical lithography, extremely small wavefront aberration has been required and the fine undulation of wave aberration has been aggressively discussed. Since CD(pattern width) variation of image depends on the local Cr density of mask, it has been regarded that the fine undulation of wavefront aberration scatters or diffracts light and causes local flare. However we think that the physical origin of local flare and the definition of fine undulation are not so clear. In this paper, we categorize wavefront aberration into figure aberration and random aberration. Therefore the concept of random aberration is useful to not only understand the local flare but also evaluate the fine undulation of wavefront aberration.

Paper Details

Date Published: 28 May 2004
PDF: 11 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.533979
Show Author Affiliations
Masato Shibuya, Tokyo Polytechnic Univ. (Japan)
Hiromi Ezaki, Tokyo Polytechnic Univ. (Japan)
Toshihumi Fukui, Tokyo Polytechnic Univ. (Japan)
Nobuaki Watanabe, Tokyo Polytechnic Univ. (Japan)
Akira Nishikata, Tokyo Polytechnic Univ. (Japan)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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