Proceedings Paper
Novel methodology for photo condition optimization through simulation| Format | Member Price | Non-Member Price |
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Paper Abstract
In photo process development, simulation plays a very important role to optimize the photo condition prior to exposure wafers. In this report we would address a systematic methodology to accelerate the photo condition optimization through simulation with the aids of statistical methods. Moreover, this systematic methodology could also be used in any experiment design and emerges as a feasibility of automatic process optimization.
Paper Details
Date Published: 28 May 2004
PDF: 10 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.533422
Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)
PDF: 10 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.533422
Show Author Affiliations
Irene Yi-Ju Su, Macronix International Co., Ltd. (Taiwan)
Rachel Huang, Macronix International Co., Ltd. (Taiwan)
Ta-Hung H. Yang, Macronix International Co., Ltd. (Taiwan)
Rachel Huang, Macronix International Co., Ltd. (Taiwan)
Ta-Hung H. Yang, Macronix International Co., Ltd. (Taiwan)
Kevin Tu, Macronix International Co., Ltd. (Taiwan)
Smith Peng, Macronix International Co., Ltd. (Taiwan)
Chih-Yuan Lu, Macronix International Co., Ltd. (Taiwan)
Smith Peng, Macronix International Co., Ltd. (Taiwan)
Chih-Yuan Lu, Macronix International Co., Ltd. (Taiwan)
Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)
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