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Proceedings Paper

Novel methodology for photo condition optimization through simulation
Author(s): Irene Yi-Ju Su; Rachel Huang; Ta-Hung H. Yang; Kevin Tu; Smith Peng; Chih-Yuan Lu
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Paper Abstract

In photo process development, simulation plays a very important role to optimize the photo condition prior to exposure wafers. In this report we would address a systematic methodology to accelerate the photo condition optimization through simulation with the aids of statistical methods. Moreover, this systematic methodology could also be used in any experiment design and emerges as a feasibility of automatic process optimization.

Paper Details

Date Published: 28 May 2004
PDF: 10 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.533422
Show Author Affiliations
Irene Yi-Ju Su, Macronix International Co., Ltd. (Taiwan)
Rachel Huang, Macronix International Co., Ltd. (Taiwan)
Ta-Hung H. Yang, Macronix International Co., Ltd. (Taiwan)
Kevin Tu, Macronix International Co., Ltd. (Taiwan)
Smith Peng, Macronix International Co., Ltd. (Taiwan)
Chih-Yuan Lu, Macronix International Co., Ltd. (Taiwan)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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