We have explored the optical near-field technology for the fabrication of subwavelength-size binary bit by the combination of the femtosecond laser of the second harmonic output with the near-field scanning optical microscopy (NSOM). The photosensitive polymer material was exposed, and the nanopatterns with feature size smaller than the laser wavelenght can be generated. It was found that the feature size depends strongly on the gap between the fiber probe tip and substrate surface. The approach offers the advantages of high precision, speed and selectivity in nanopatterning, and is promising to be used in data storage device manufacture for high density data storage.

Date Published: 16 September 2003
PDF: 5 pages
Proc. SPIE 5069, Optical Data Storage 2003, (16 September 2003); doi: 10.1117/12.533122

Published in SPIE Proceedings Vol. 5069:
Optical Data Storage 2003
Michael O'Neill; Naoyasu Miyagawa, Editor(s)