Proceedings Paper
Electron beam mastering process realizing over 100-GB/layer capacity disc| Format | Member Price | Non-Member Price |
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Paper Abstract
We have demonstrated the capability of 100GB density recording by the electron beam mastering and readout by a near-field optical pick-up with an effective NA of 2.05 and a blue LD of 405 nm wavelength. The Si disc of 100GB density was fabricated by the optimized Si etching process condition to form suitable pit pattern shape for the near-field readout.
Paper Details
Date Published: 16 September 2003
PDF: 6 pages
Proc. SPIE 5069, Optical Data Storage 2003, (16 September 2003); doi: 10.1117/12.533039
Published in SPIE Proceedings Vol. 5069:
Optical Data Storage 2003
Michael O'Neill; Naoyasu Miyagawa, Editor(s)
PDF: 6 pages
Proc. SPIE 5069, Optical Data Storage 2003, (16 September 2003); doi: 10.1117/12.533039
Show Author Affiliations
Minoru Takeda, Sony Corp. (Japan)
Motohiro Furuki, Sony Corp. (Japan)
Masanobu Yamamoto, Sony Corp. (Japan)
Masataka Shinoda, Sony Corp. (Japan)
Kimihiro Saito, Sony Corp. (Japan)
Motohiro Furuki, Sony Corp. (Japan)
Masanobu Yamamoto, Sony Corp. (Japan)
Masataka Shinoda, Sony Corp. (Japan)
Kimihiro Saito, Sony Corp. (Japan)
Yuichi Aki, Sony Corp. (Japan)
Hiroshi Kawase, Sony Corp. (Japan)
Mitsuru Koizumi, JEOL Ltd. (Japan)
Toshiaki Miyokawa, JEOL Ltd. (Japan)
Masao Mutou, JEOL Ltd. (Japan)
Hiroshi Kawase, Sony Corp. (Japan)
Mitsuru Koizumi, JEOL Ltd. (Japan)
Toshiaki Miyokawa, JEOL Ltd. (Japan)
Masao Mutou, JEOL Ltd. (Japan)
Published in SPIE Proceedings Vol. 5069:
Optical Data Storage 2003
Michael O'Neill; Naoyasu Miyagawa, Editor(s)
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