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Proceedings Paper

Improvement of near-field mastering with a 266-nm laser
Author(s): Shingo Imanishi; Minoru Takeda; Masanobu Yamamoto; Nobuhiko Mukai; Katsuji Takagi; Toshiyuki Kono
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Paper Abstract

Near-field mastering process with a 266 nm laser was improved in the stability for long time exposure and in the performance for ROM exposure. The exposure stability was achieved by using a chemically amplified type photoresist and by setting the air gap large. The exposure performance was achieved by reducing the aberration of the objective lens and by adjusting the focal position precisely. As a result, 100 nm narrow width was obtained in the groove structure, and good signal quality was obtained from a 25 gigabyte (GB) read only memory (ROM) disc. A full area exposure for a 25 GB ROM disc was also achieved.

Paper Details

Date Published: 16 September 2003
PDF: 6 pages
Proc. SPIE 5069, Optical Data Storage 2003, (16 September 2003); doi: 10.1117/12.532755
Show Author Affiliations
Shingo Imanishi, Sony Corp. (Japan)
Minoru Takeda, Sony Corp. (Japan)
Masanobu Yamamoto, Sony Corp. (Japan)
Nobuhiko Mukai, Sony Corp. (Japan)
Katsuji Takagi, Sony Corp. (Japan)
Toshiyuki Kono, Sony Corp. (Japan)

Published in SPIE Proceedings Vol. 5069:
Optical Data Storage 2003
Michael O'Neill; Naoyasu Miyagawa, Editor(s)

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