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Proceedings Paper

Excimer-laser-induced defect generation in Lithosil
Author(s): Ute Natura; Oliver Sohr; Martin Letz; Rolf Martin; Michael Kahlke; Gabriele Fasold
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Paper Abstract

Fused silica is used as lens material in DUV microlithography systems. The exposure of fused silica to high-energy excimer laser pulses over long periods of time modifies the material. Marathon experiments were conducted at different energy densities with the KrF- and ArF excimer laser to describe the material parameters under long time irradiation. A model was developed to describe the radiation induced absorption and the change of the index of refraction. The defect generation is associated with the consumption of hydrogen. The dependence of hydrogen consumption on the wavelength of irradiation, the energy density and the initial hydrogen content was investigated in detail. The saturation of H2 consumption in Lithosil was proved by different experiments. The results are in very good agreement with the model calculations.

Paper Details

Date Published: 28 May 2004
PDF: 7 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.531653
Show Author Affiliations
Ute Natura, Schott Lithotec AG (Germany)
Oliver Sohr, Schott Glas (Germany)
Martin Letz, Schott Glas (Germany)
Rolf Martin, Schott Lithotec AG (Germany)
Michael Kahlke, Schott Lithotec AG (Germany)
Gabriele Fasold, Schott Lithotec AG (Germany)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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