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Proceedings Paper

Continuous-tone gray-scale photomasks based on photosensitive spin-on-glass technology for deep-UV lithography applications
Author(s): Edgar A. Mendoza; F. A. Sigoli; H. Paulus; L. Q. Giang; M. Seifouri; E. Lam; Lothar U. Kempen; Farvardin Johansooz
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Paper Abstract

A technology for the low cost production of continuous tone gray scale photomasks for deep UV photolithography applications has been demonstrated. This technology is based on the use of a photosensitive spin-on-glass (SOG) thin film deposited onto a UV transparent substrate such as quartz. Different light exposure energies, from either a lithography setup or a laser pattern generator, onto the photosensitive SOG film changes the UV absorption spectrum at both H and I mercury emission lines. The amount of photo induced attenuation on the film is directly proportional to light exposure energy, hence allowing the formation of fully continuous tone patterns. Once the image pattern is photo-generated with a resolution of 0.1 to 1 micrometer, it is permanently fixed by a thermal treatment step without the need of an etching step. This new continuous tone deep UV photomask technology offers new cost effective opportunities for the production of micro-electro-mechanical systems (MEMS) structures, diffractive optical elements (DOEs), computer generated holograms (CGHs), and kinoform optics.

Paper Details

Date Published: 17 December 2003
PDF: 8 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.528092
Show Author Affiliations
Edgar A. Mendoza, OptiNetrics, Inc. (United States)
F. A. Sigoli, OptiNetrics, Inc. (United States)
H. Paulus, OptiNetrics, Inc. (United States)
L. Q. Giang, OptiNetrics, Inc. (United States)
M. Seifouri, OptiNetrics, Inc. (United States)
E. Lam, OptiNetrics, Inc. (United States)
Lothar U. Kempen, OptiNetrics, Inc. (United States)
Farvardin Johansooz, Hoya Holdings (United States)

Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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