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Proceedings Paper

Continuous tone gray-scale photomask for deep UV lithography applications
Author(s): Edgar A. Mendoza; Fernando Sigoli; Heidi Paulus; Luan Q. Giang; Mahmood Seifouri; E. Lam; Lothar Kempen
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Paper Abstract

Continuous tone gray scale deep UV photomask technology offers new cost effective opportunities for the mass scale production of MEMS structures, diffractive optical elements (DOEs), computer generated holograms (CGHs), and kinoform optics. A new technology for the low cost fabrication of continuous tone gray scale photomasks for deep UV photolithography applications has been demonstrated. This technology is based on the use of a photosensitive spin-on-glass (SOG) thin film deposited onto a UV transparent substrate such as fused silica. Light exposure, from either a lithography setup or a laser pattern generator, onto the photosensitive SOG film induces a color change from clear (UV transparent) to dark (UV absorbing). The amount of photo induced color attenuation on the film is directly proportional to the energy exposure of the light, hence allowing the formation of fully continuous tone patterns. Once exposed the image pattern, with a resolution of 0.1 micrometers, is permanently fixed by heat treatment without the need of an etching step.

Paper Details

Date Published: 28 May 2004
PDF: 6 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.527581
Show Author Affiliations
Edgar A. Mendoza, OptiNetrics, Inc. (United States)
Fernando Sigoli, OptiNetrics, Inc. (United States)
Heidi Paulus, OptiNetrics, Inc. (United States)
Luan Q. Giang, OptiNetrics, Inc. (United States)
Mahmood Seifouri, OptiNetrics, Inc. (United States)
E. Lam, OptiNetrics, Inc. (United States)
Lothar Kempen, OptiNetrics, Inc. (United States)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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