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Proceedings Paper

Characterization of a flat superpolished mandrel prototype with hard (TiN/SiC) overcoating to enhance the surface durability
Author(s): Daniele Spiga
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Paper Abstract

A number of hard X-Ray (10 - 100 KeV) astronomical missions of near future will make use of multilayer-coated focusing mirrors. The technology based on Nickel electroformed replication is suitable for the multilayer optics realization, since multi-modular telescopes are foreseen. For example, for the Constellation-X mission there is the need of realizing up to 14 identical modules (12 flight modules plus two spares) which can be replicated by the same series of mandrels. The Ni replication approach is derived from the method already successfully used for making the Au coated soft X-ray mirrors with good imaging performances of the missions BeppoSAX, XMM-Newton and Swift. In the technological extension of the process to the multilayer optics fabrication, it would be convenient to overcoat the external surface of mandrels (normally in Kanigen) with a layer made of a very hard material. This would help to maintain the very low roughness level requested by the application (typically less than a couple of Angstroms for a 1 micrometer scan length with AFM) also after many replications and successive cleaning of the mandrel. Good material candidate are at this regard TiN and SiC, both characterized by a very high hardness. We have proven that flat prototypes with TiN and SiC overcoating can be superpolished at a level comparable to the traditional electroless Nickel coating. In this paper we will present a characterization by topographic measurement (AFM and WYKO) and by X-Ray scattering of two of these samples.

Paper Details

Date Published: 29 January 2004
PDF: 11 pages
Proc. SPIE 5168, Optics for EUV, X-Ray, and Gamma-Ray Astronomy, (29 January 2004); doi: 10.1117/12.527090
Show Author Affiliations
Daniele Spiga, Osservatorio Astronomico di Brera (Italy)
Univ. degli Studi di Milano-Bicocca (Italy)

Published in SPIE Proceedings Vol. 5168:
Optics for EUV, X-Ray, and Gamma-Ray Astronomy
Oberto Citterio; Stephen L. O'Dell, Editor(s)

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