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Proceedings Paper

A review of the emerging SEMI standards for particle scanners
Author(s): John C. Stover
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Paper Abstract

A suite of SEMI standards is emerging with new specifications for the calibration of particle scanners used in the semiconductor industry. The four documents specify the characteristics required of PSL sphere depositions to be used for calibration, the manner in which capture rate is calculated, the method used for scanner calibration and a check for deposition system use. This paper overviews the background technology as well as the struggle of various industry segments as they worked out the key requirements of these documents.

Paper Details

Date Published: 4 November 2003
PDF: 7 pages
Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); doi: 10.1117/12.519111
Show Author Affiliations
John C. Stover, The Scatter Works, Inc. (United States)

Published in SPIE Proceedings Vol. 5188:
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies
Angela Duparre; Bhanwar Singh, Editor(s)

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