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Proceedings Paper

A common base for mask cost of ownership
Author(s): Walter J. Trybula
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Paper Abstract

There has been a proliferation of examples of mask cost projections for future ITRS nodes and various technologies. This paper reviews the methodology developed at SEMATECH to insure that projected mask costs reflect the geometries being planned. A detailed description provides the development of the mask manufacturing process and develops a projected cost.

Paper Details

Date Published: 17 December 2003
PDF: 6 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518237
Show Author Affiliations
Walter J. Trybula, International SEMATECH (United States)

Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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