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Proceedings Paper

Reticle surface contaminants and their relationship to subpellicle particle formation
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Paper Abstract

Sub-pellicle particle formation continues to be a significant problem in semiconductor fabs. We have previously reported on the identification of various defects detected on reticles after extended use. This paper provides a comprehensive evaluation of various molecular contaminants found on the backside surface of a reticle used in high-volume production. Previously all or most of the photo-induced contaminants were detected under the pellicle. This particular contamination is a white "haze" detected by pre-exposure inspection using KLA-Tencor TeraStar STARlight with Un-patterned Reticle Surface Analysis, (URSA). Chemical analysis was done using Time-of-Flight Secondary Ion Mass Spectroscopy (ToF-SIMS) and Raman spectroscopy.

Paper Details

Date Published: 17 December 2003
PDF: 8 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518105
Show Author Affiliations
Brian J. Grenon, Grenon Consulting, Inc. (United States)
Kaustuve Bhattacharyya, KLA-Tencor Corp. (United States)
William Waters Volk, KLA-Tencor Corp. (United States)
Andre Poock, AMD Saxony Manufacturing GmbH (Germany)

Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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