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Proceedings Paper

Advanced FIB mask repair technology for 90-nm/ArF lithography: III
Author(s): Yoshiyuki Tanaka; Yasutoshi Itou; Nobuyuki Yoshioka; Ryoji Hagiwara; Anto Yasaka; Osamu Takaoka; Tomokazu Kozakai; Yoshihiro Koyama; Hiroshi Sawaragi; Yasuhiko Sugiyama; Masashi Muramatsu; Toshio Doi; Katsumi Suzuki; Mamoru Okabe; Masashi Shinohara; Osamu Matsuda; Kazuo Aita; Tatsuya Adachi; Yasutaka Morikawa; Masaharu Nishiguchi; Yasushi Satoh; Naoya Hayashi
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Paper Abstract

The SIR5000 mask repair system was developed with an FIB system featuring new ion optics, modified SED detectors, new platform software and optimized repair processes to repair 130nm/ArF generation masks. Thereafter we have continuously improved it for 90nm/ArF lithography and evaluated its performance such as edge placement repeatability, lithography simulation and printing tests. The transmittance of FIB imaging area is more than 95% over 70 times scans, and the printing result data also shows that the imaging damage by FIB scans little affect CD until around 70 times. The ED windows of both repaired clear and opaque defects almost overlap non repaired reference ones, and they show that the printing performance of repaired mask does not have any printing issues. Consequently, we demonstrated that the improved SIR5000 capability has reached the 90nm node mask technology requirement.

Paper Details

Date Published: 17 December 2003
PDF: 12 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518026
Show Author Affiliations
Yoshiyuki Tanaka, Semiconductor Leading Edge Technologies, Inc. (Japan)
Yasutoshi Itou, Semiconductor Leading Edge Technologies, Inc. (Japan)
Nobuyuki Yoshioka, Semiconductor Leading Edge Technologies, Inc. (Japan)
Ryoji Hagiwara, Seiko Instruments Inc. (Japan)
Anto Yasaka, Seiko Instruments Inc. (Japan)
Osamu Takaoka, Seiko Instruments Inc. (Japan)
Tomokazu Kozakai, Seiko Instruments Inc. (Japan)
Yoshihiro Koyama, Seiko Instruments Inc. (Japan)
Hiroshi Sawaragi, Seiko Instruments Inc. (Japan)
Yasuhiko Sugiyama, Seiko Instruments Inc. (Japan)
Masashi Muramatsu, Seiko Instruments Inc. (Japan)
Toshio Doi, Seiko Instruments Inc. (Japan)
Katsumi Suzuki, Seiko Instruments Inc. (Japan)
Mamoru Okabe, Seiko Instruments Inc. (Japan)
Masashi Shinohara, Seiko Instruments Inc. (Japan)
Osamu Matsuda, Seiko Instruments Inc. (Japan)
Kazuo Aita, Seiko Instruments Inc. (Japan)
Tatsuya Adachi, Seiko Instruments Inc. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Masaharu Nishiguchi, Dai Nippon Printing Co., Ltd. (Japan)
Yasushi Satoh, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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